Intern - Photolithography Process Development

Full-time Other-General

Overview

Location: Fab10N Singapore

Department: Process Development – Singapore (Photolithography)

Project title: Edge Placement Error Modeling and Optimization

Project Description: Develop and optimize models for overlay and critical dimension uniformity improvement. Project scope: Introduction to photolithography for semiconductor patterning and control.

Deliverables

• Develop and deploy edge placement error model for photolithography

Skillset Required

• Mathematical modeling and numerical analysis with programming knowledge (preferred)
• Characterization techniques: SEM, optical imaging

Course Of Interest

• Semiconductor Manufacturing
• Nanomaterials
• Physics
• Mathematical modeling
• Programming

Duration

4-6 months (minimum 4 months)

About the Company

We are an industry leader in innovative me...